Multiscale modeling of FIB-induced damage

Themenbereich:
Modellierung & Simulation

 

Verantwortlicher Mitarbeiter:

Prof. Dr.-Ing. Erik Bitzek (Privatdozent)



Projektbeschreibung

The performance and lifetime of small-scale materials and devices (nanostructured materials, thin films, MEMS, …) are critically influenced by intrinsic stresses resulting from manufacturing. However, the established techniques for micron-scale measurements of residual stresses still have strong limitations. The goal of the EU-project “Pre-standardisation of incremental FIB micro-milling for intrinsic stress evaluation at the sub-micron scale” (iSTRESS) was to develop an innovative protocol for the analysis of residual stress distribution on a (sub)micron-scale. Within this project, in close collaboration with the group of Prof. A. Korsunsky (Oxford, UK), we developed a multiscale approach to model FIB-induced damage and induce strain in inhomogeneous and anisotropic materials. The project officially ended in December 2016. However, the study of the effects of irradiation induced damage on the mechanical response of materials (metals, ceramic, …) is currently still very active in our group.

Weitere Informationen

Related publications:

  • J. Guénolé, A. Prakash and E. Bitzek [2017], „Atomistic simulations of focused ion beam machining of strained silicon“, Applied Surface Science 416, 86–95 Link to paper
  • J. Guénolé, A. Prakash and E. Bitzek [2016], „Influence of intrinsic strain on irradiation induced damage: the role of threshold displacement and surface binding energies“, Materials and Design 111, 405-413 Link to paper
  • A. Korsunsky, J. Guénolé, E. Salvati, T. Sui, Mahmoud Mousavi, A. Prakash and E. Bitzek [2016], „Quantifying eigenstrain distributions induced by focussed ion beam damage in silicon“, Materials Letters 185 47-49 Link to paper